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Sputter

Cluster Sputter

  • 양산라인은 물론 개발 및 연구소 등에 적합한 System
  • Metal, Oxide등 다양한 재질의 공정이 가능하며, Wafer Size, Type 에 따라 간단하게Conversion 이 가능.
  • Application: SAW Filter, LED

FEATURES

Full Auto Dual Asher System
- Wafer Size : 2inch~6inch
Wafer Type: Si, LT Wafer(180~250㎛)
Process Application : Thin film(Metal, Oxide), Seed Metal(SWA Filter)
Loading: cassette(4”X24ea), PM(4”X8ea), Vacuum Robot
Process Module: 2Proccess chamber, 1Pre-treatment chamber, 1Degas chamber
Excellent Throughput
Cathode Type: Round Magnetron cathode.